This inventor holds 1 USPTO granted patent. Top assignee: United Microelectronics Corp.. Active years: 2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002
Title: Hsein-Ta Chung: Innovator in Semiconductor Technology
Introduction
Hsein-Ta Chung is a notable inventor based in Tai-Chung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of photo-resist layer removal.
Latest Patents
Hsein-Ta Chung holds a patent for a method of removing a photo-resist layer on a semiconductor wafer. This innovative method involves a two-step process. The first step is a dry cleaning process that injects a nitrogen-containing gas into an oxygen-free environment, utilizing a plasma reaction to remove most of the photo-resist layer. The second step is a wet cleaning process that ensures the complete removal of the photo-resist layer. He has 1 patent to his name.
Career Highlights
Hsein-Ta Chung is associated with United Microelectronics Corporation, a leading company in the semiconductor industry. His work has contributed to advancements in semiconductor manufacturing processes.
Collaborations
He has collaborated with notable colleagues, including Yi-Yu Hsu and Tong-Yu Chen, to further enhance the development of semiconductor technologies.
Conclusion
Hsein-Ta Chung's innovative methods in semiconductor technology demonstrate his commitment to advancing the field. His contributions are vital for the ongoing evolution of semiconductor manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile