Taipei, Taiwan

Hsao Shih

This inventor holds 2 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2019-2021.


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Location History:

  • Hsinchu, TW (2019)
  • New Taipei, TW (2021)

Company Filing History:


Years Active: 2019-2021

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2 patents (USPTO):Explore Patents

Title: Hsao Shih: Innovator in Photomask Technology

Introduction

Hsao Shih is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of photomask technology, holding a total of 2 patents. His work focuses on innovative methods for manufacturing photomasks, which are essential in the semiconductor industry.

Latest Patents

Hsao Shih's latest patents include a method of manufacturing a photomask that involves several key steps. The process begins with the formation of a phase shift layer and a hard mask layer on a light-transmitting substrate. A predetermined mask pattern is then split into a first pattern and a second pattern. This is followed by a series of processes, including a first exposure process for transferring the first pattern and a second exposure process for the second pattern, executed by different machines. Another notable patent is related to a mask blank and fabrication method, which includes providing a mask blank, removing a portion of the resist layer to form a patterned resist layer, and patterning the cooling layer using the patterned resist layer as an etching mask.

Career Highlights

Hsao Shih is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise in photomask technology has positioned him as a valuable asset to the company.

Collaborations

Hsao Shih has collaborated with notable coworkers, including Cheng-Ming Lin and Hao-Ming Chang. Their combined efforts contribute to advancements in semiconductor manufacturing processes.

Conclusion

Hsao Shih's innovative work in photomask technology and his contributions to Taiwan Semiconductor Manufacturing Company Limited highlight his importance in the field. His patents reflect a commitment to advancing semiconductor manufacturing techniques.

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