Howard S Lee

Title: Howard S. Lee: Innovator in LDMOS Transistor Technology

Introduction

Howard S. Lee is a prominent inventor based in Plano, TX (US). He has made significant contributions to the field of semiconductor technology, particularly in the manufacturing of LDMOS transistors. With a total of 2 patents to his name, Lee's work has had a notable impact on the industry.

Latest Patents

Lee's latest patents focus on methods to manufacture LDMOS transistors with improved threshold voltage control. One of his patents describes a process where a double diffused region is formed in a semiconductor substrate or in an epitaxial layer. This process involves implanting light implant species, such as boron, through an opening in a photoresist layer prior to a hard bake process. Following this, a heavy implant species, such as arsenic, is implanted into the epitaxial layer. The double diffused region is then formed during subsequent processing, such as during LOCOS formation, through a thermal anneal. A dielectric layer is formed on the epitaxial layer, and gate structures are created over the dielectric layer.

Career Highlights

Howard S. Lee is currently employed at Texas Instruments Corporation, where he continues to innovate in the field of semiconductor technology. His expertise in LDMOS transistors has positioned him as a key figure in the development of advanced electronic components.

Collaborations

Lee has collaborated with notable coworkers, including Binghua Hu and Henry Litzmann Edwards, contributing to various projects and advancements in semiconductor technology.

Conclusion

Howard S. Lee's contributions to the field of LDMOS transistors exemplify his dedication to innovation and excellence in semiconductor manufacturing. His patents and work at Texas Instruments Corporation highlight his significant role in advancing technology in this critical area.