Company Filing History:
Years Active: 2019-2025
Title: Hossam A Abdallah: Innovator in Semiconductor Lithography
Introduction
Hossam A Abdallah is a prominent inventor based in Portland, OR (US), known for his significant contributions to the field of semiconductor lithography. With a total of five patents to his name, Abdallah has made remarkable advancements in techniques that enhance the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Abdallah's latest patents include innovative techniques for extreme ultraviolet (EUV) lithography patterning. One of his notable inventions focuses on improving EUV patterning using assist features. This method involves patterning semiconductor fins and assist features into a semiconductor substrate, which increases the coverage of absorber material in the EUV mask. As a result, this technique reduces bright field defects in the EUV patterning process. Another significant patent involves pattern decomposition lithography techniques, which allow for the realization of a two-dimensional target lithography feature by decomposing it into multiple unidirectional target features. This approach ensures that the original target feature is fully represented without leaving any unrepresented remainder.
Career Highlights
Hossam A Abdallah is currently employed at Intel Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing advanced lithography techniques that are crucial for the production of modern integrated circuits and systems.
Collaborations
Throughout his career, Abdallah has collaborated with notable colleagues, including Charles Henry Wallace and Elliot Tan. These partnerships have fostered an environment of innovation and have contributed to the successful development of his patented technologies.
Conclusion
Hossam A Abdallah stands out as a key figure in the semiconductor industry, with his innovative patents and contributions to lithography techniques. His work at Intel Corporation and collaborations with esteemed colleagues highlight his commitment to advancing technology in this critical field.