Horst Borndorfer

Title: Horst Borndorfer: Innovator in Photoresist Technology

Introduction

Horst Borndorfer is a notable inventor based in Erlangen, Germany. He has made significant contributions to the field of photoresist technology, holding a total of three patents. His work focuses on developing advanced materials and methods that enhance the capabilities of photoresist applications.

Latest Patents

One of Borndorfer's latest patents is for a dry-developable positive resist. This innovative method allows for the production of high-resolution resist structures with steep edges using standard equipment. The process involves a photoresist layer made from a polymer containing anhydride groups and blocked imide or phenolic hydroxyl groups. This layer is treated with a photoactive component that generates a strong acid during irradiation. Following the irradiation with a patterned image, the photoresist layer is treated with a water-based or water-alcohol-based solution of a polyfunctional amino or hydroxy-siloxane, and subsequently etched in an oxygen-containing plasma.

Career Highlights

Horst Borndorfer is currently employed at Siemens Aktiengesellschaft, where he continues to push the boundaries of photoresist technology. His work has been instrumental in advancing the field, particularly in applications requiring high sensitivity in the deep UV range.

Collaborations

Throughout his career, Borndorfer has collaborated with several talented individuals, including Recai Sezi and Rainer Leuschner. These collaborations have contributed to the successful development of innovative technologies in the industry.

Conclusion

Horst Borndorfer's contributions to photoresist technology exemplify his commitment to innovation and excellence. His patents and work at Siemens Aktiengesellschaft highlight his role as a leading inventor in this specialized field.