The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 1993
Filed:
Apr. 26, 1991
Recai Sezi, Rottenbach, DE;
Horst Borndorfer, Erlangen, DE;
Eva Rissel, Forchheim, DE;
Rainer Leuschner, Erlangen, DE;
Michael Sebald, Hessdorf-Hannberg, DE;
Hellmut Ahne, Rottenbach, DE;
Siegfried Birkle, Hochstadt A/Aisch,all of, DE;
Siemens Aktiengesellschaft, Munich, DE;
Abstract
High resolution resist structures with steep edges are obtained using standard equipment, with high sensitivity, particularly in the deep UV range. A photoresist layer consisting of a polymer having anhydride groups and blocked imide- or phenolic hydroxyl groups and of a photoactive component which forms a strong acid during irradiation is first deposited on a substrate, followed by irradiation with a patterned image. The irradiated photoresist layer is then treated with a water-based or a water-alcohol-based solution of a polyfunctional amino- or hydroxy-siloxane, and is etched in an oxygen-containing plasma.