This inventor holds 2 USPTO granted patents. Top assignees: Hitachi Global Storage Technologies Netherlands B.v., Kla Tencor Corporation. Active years: 2011-2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
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Years Active: 2011-2012
Title: Innovations of Inventor Hong Du
Introduction
Hong Du is an accomplished inventor based in Saratoga, California. He holds two patents that showcase his expertise in advanced lithography techniques. His work has significantly contributed to the field of photolithography, particularly in the production of critical symmetrical structures.
Latest Patents
Hong Du's latest patents include "Advanced Phase Shift Lithography" and "Attenuated Phase Shift Mask for Narrow Track Width Write Pole Definition." The first patent describes a method for patterning a wafer using phase-shifting photolithography, which can create critical symmetrical two-dimensional structures, such as a magnetic write pole of a magnetic write head. This invention features a photolithographic mask with an opaque portion and narrow, transparent phase-shifting regions on either side, ensuring that the image produced on the wafer is completely symmetrical. The second patent involves computer-implemented methods for predicting the printability of reticle features on a wafer. This method generates simulated images of reticle features printed on the wafer under various exposure conditions and compares them to actual printed features to select the best predictive model.
Career Highlights
Throughout his career, Hong Du has worked with notable companies such as Kla Tencor Corporation and Hitachi Global Storage Technologies Netherlands B.V. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in lithography technology.
Collaborations
Hong Du has collaborated with talented individuals in his field, including Bo Su and Gaurav Verma. These collaborations have fostered innovation and the exchange of ideas, further enhancing the impact of his work.
Conclusion
Hong Du's contributions to the field of photolithography through his patents and career achievements highlight his role as a significant innovator. His work continues to influence advancements in technology and manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile