The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2011
Filed:
May. 06, 2008
BO Su, San Jose, CA (US);
Gaurav Verma, Sunnyvale, CA (US);
Hong Du, Saratoga, CA (US);
Rui-fang Shi, Cupertino, CA (US);
Scott Andrews, Mountain View, CA (US);
Bo Su, San Jose, CA (US);
Gaurav Verma, Sunnyvale, CA (US);
Hong Du, Saratoga, CA (US);
Rui-fang Shi, Cupertino, CA (US);
Scott Andrews, Mountain View, CA (US);
KLA-Tencor Corp., San Jose, CA (US);
Abstract
Computer-implemented methods, systems, and computer-readable media for determining a model for predicting printability of reticle features on a wafer are provided. One method includes generating simulated images of the reticle features printed on the wafer using different generated models for a set of different values of exposure conditions. The method also includes determining one or more characteristics of the reticle features of the simulated images. In addition, the method includes comparing the one or more characteristics of the reticle features of the simulated images to one or more characteristics of the reticle features printed on the wafer using a lithography process. The method further includes selecting one of the different generated models as the model to be used for predicting the printability of the reticle features based on results of the comparing step.