This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Cmc Materials, Inc.. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: Holland Hodges: Innovator in Chemical Mechanical Planarization
Introduction
Holland Hodges is a notable inventor based in Sammamish, WA (US). She has made significant contributions to the field of chemical mechanical polishing, particularly through her innovative patent. With a focus on enhancing the efficiency and effectiveness of polishing pads, her work has implications for various industries.
Latest Patents
Holland Hodges holds a patent for "Chemical mechanical planarization pads with constant groove volume." This invention features a chemical mechanical polishing pad that includes a surface portion made of a first material. The surface portion is designed with a plurality of grooves, where a first portion consists of exposed grooves located at the surface of the pad. The second portion comprises buried grooves that are embedded below the surface, allowing for one or more of the buried grooves to be exposed during use. This innovative design aims to improve the performance of chemical mechanical polishing processes.
Career Highlights
Holland is currently employed at CMC Materials, Inc., where she continues to develop and refine her inventions. Her work at the company has positioned her as a key player in the advancement of polishing technologies. With her expertise, she contributes to the ongoing evolution of materials used in various applications.
Collaborations
Holland collaborates with talented individuals in her field, including coworkers Paul Andre Lefevre and Devin Schmitt. These collaborations foster an environment of innovation and creativity, allowing for the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Holland Hodges is a pioneering inventor whose work in chemical mechanical planarization has made a significant impact on the industry. Her patent for polishing pads demonstrates her commitment to innovation and excellence. Through her career at CMC Materials, Inc., she continues to push the boundaries of technology and improve processes in her field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile