Oshu, Japan

Hitoshi Katoh

This inventor holds 3 USPTO granted patents and 1 EPO patent. Top assignee: Tokyo Electron Limited. Active years: 2006-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hitoshi Katoh. Retrieved from https://idiyas.com/inventor/hitoshi-katoh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 66.7


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Location History:

  • Tokyo, JP (2006)
  • Oshu, JP (2012 - 2015)

Company Filing History:


Years Active: 2006-2015

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3 patents (USPTO):Explore Patents

Title: Hitoshi Katoh: Innovator in Semiconductor Processing

Introduction

Hitoshi Katoh is a prominent inventor based in Oshu, Japan, known for his significant contributions to semiconductor processing technology. With a total of three patents to his name, Katoh has developed innovative methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

One of Katoh's latest patents is a semiconductor processing system that includes a vaporizer and a method for using the same. This invention features a film formation apparatus designed to create a high-dielectric constant thin film on target substrates, along with a gas supply apparatus for delivering process gas. The method involves a preparatory stage that determines a specific pressure range within a vaporizing chamber for a liquid material cooled at a designated temperature. This stage includes obtaining critical limit values of pressure that affect the vaporization process, ultimately defining a set pressure range for optimal performance.

Another notable patent addresses the removal of metal contaminants deposited on quartz members used in vertical heat processing apparatuses for semiconductor processes. This method outlines a comprehensive cleaning procedure that includes several stages: diluted hydrofluoric acid cleaning, purified water cleaning, hydrochloric acid cleaning, and a final purified water cleaning. This meticulous approach ensures the quartz member is thoroughly cleaned and ready for use in semiconductor applications.

Career Highlights

Hitoshi Katoh is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at this esteemed organization has allowed him to push the boundaries of semiconductor technology and contribute to advancements in the field.

Collaborations

Throughout his career, Katoh has collaborated with notable colleagues, including Tsuneyuki Okabe and Takeshi Kumagai. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Hitoshi Katoh's contributions to semiconductor processing through his innovative patents and collaborative efforts highlight his importance in the field. His work continues to influence the development of advanced semiconductor technologies, making a lasting impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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