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For the Inventor, By the Inventor

Ibaraki, Japan

Hitoshi Ishizaka

USPTO Granted Patents = 10

Average Co-Inventor Count = 2.1

ph-index = 4

Forward Citations = 58(Granted Patents)


Location History:

  • Osaka, JP (1995 - 2009)
  • Ibaraki, JP (1997 - 2010)

Company Filing History:

goldMedal10 out of 3,868 
 
Nitto-denko Corporation
 patents

Years Active: 1995-2010

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10 patents (USPTO):Explore Patents
1. 7793668 - Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them (2010-09-14),
2. 7632599 - Separator for fuel cell and fuel cell using the same (2009-12-15),
3. 7561434 - Wired circuit board and method for manufacturing wired circuit board and mounting electronic component thereon (2009-07-14),
4. 7358619 - Tape carrier for TAB (2008-04-15),
5. 7006879 - Boring method for circuit board (2006-02-28),
6. 6642478 - Method for forming a via hole, flexible wiring board using the method, and method for producing the flexible wiring board (2003-11-04),
7. 6373709 - Flexible wiring board (2002-04-16),
8. 6168910 - Method for removing residue and method for production of printed board having hole (2001-01-02),
9. 5691210 - Method for fabrication of probe structure and circuit substrate therefor (1997-11-25),
10. 5411779 - Composite tubular article and process for producing the same (1995-05-02),

Title: Hitoshi Ishizaka: Innovator in Cleaning Technologies

Introduction

Hitoshi Ishizaka is a prominent inventor based in Ibaraki, Japan. He has made significant contributions to the field of cleaning technologies, holding a total of 10 patents. His innovative work focuses on developing advanced cleaning solutions for various applications.

Latest Patents

Ishizaka's latest patents include a cleaning sheet designed for removing foreign matters from the interior of substrate processing equipment. This cleaning sheet features a cleaning layer with minimal tackiness and a tensile modulus of not less than 0.98 N/mm², as determined by JIS K7127. Additionally, he has developed a separator for fuel cells that is lightweight, easily made thin, and exhibits superior corrosion resistance and shape stability. This invention includes a conductor pattern formed on one principal plane of an insulation layer, facilitating a gas flow path and electrical connections through a via hole.

Career Highlights

Hitoshi Ishizaka is associated with Nitto Denko Corporation, where he has been instrumental in advancing cleaning technologies. His work has not only contributed to the company's innovation portfolio but has also enhanced the efficiency of various industrial processes.

Collaborations

Ishizaka has collaborated with notable colleagues, including Atsushi Hino and Toshio Nakajima. Their combined expertise has fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Hitoshi Ishizaka's contributions to cleaning technologies exemplify the spirit of innovation. His patents reflect a commitment to improving industrial processes and enhancing product performance. His work continues to influence the field and inspire future advancements.

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