Hitoshi Hokari

Title: Hitoshi Hokari: Innovator in Thin Film Transistor Technology

Introduction

Hitoshi Hokari is a notable inventor based in Hamura, Japan. He has made significant contributions to the field of thin film transistors, holding a total of three patents. His work focuses on manufacturing methods that enhance the performance and efficiency of electronic devices.

Latest Patents

Hokari's latest patents include a manufacturing method of thin film transistors that incorporates low resistance conductive thin films. This method involves forming a pair of source and drain electrodes on a substrate, creating a gap between them. Low resistance conductive thin films are then formed on these electrodes, followed by an oxide semiconductor thin film layer that functions as a channel. The innovative design ensures that the side surfaces of the oxide semiconductor thin film layer align with the corresponding surfaces of the conductive thin films, optimizing the channel width direction. Another patent details a thin film transistor that includes a substrate, source and drain electrodes, and low resistance conductive thin films, all working together to enhance the functionality of the device.

Career Highlights

Hitoshi Hokari has worked with prominent companies such as Casio Computer Co., Ltd. and the Kochi Industrial Promotion Center. His experience in these organizations has allowed him to develop and refine his innovative ideas in the field of electronics.

Collaborations

Hokari has collaborated with notable coworkers, including Hiromitsu Ishii and Motohiko Yoshida. Their combined expertise has contributed to the advancement of thin film transistor technology.

Conclusion

Hitoshi Hokari's contributions to the field of thin film transistors demonstrate his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving electronic device performance, making him a significant figure in the industry.