This inventor holds 2 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1977-1985.
Location History:
- Poughkeepsie, NY (US) (1977)
- Bloomfield Hills, MI (US) (1985)
Company Filing History:
Years Active: 1977-1985
Title: The Innovations of Hitendra N Ghosh
Introduction
Hitendra N Ghosh is a notable inventor based in Poughkeepsie, NY (US). He has made significant contributions to the field of silicon crystal growth and semiconductor technology. With a total of 2 patents, Ghosh's work has had a profound impact on the industry.
Latest Patents
Ghosh's latest patents include a method of controlling oxygen content and distribution in grown silicon. This innovative approach improves the Czochralski method of growing silicon crystals, allowing for a desired oxygen concentration level with both axial and radial uniformity. The method involves a crucible located within a heater to achieve a specific temperature profile related to the oxygen concentration. The crucible is then raised and rotated at an increasing speed, along with a high crystal rotation rate, to achieve the desired uniformity.
Another significant patent is the utilization of an arsenic diffused emitter in the fabrication of a high-performance semiconductor. This method produces a substantially square N-type impurity distribution profile in a silicon substrate, which enhances the direct current (dc) and alternating current (ac) characteristics of PN junction devices. The square profile is achieved through the diffusion of arsenic in the silicon substrate, allowing for a sharper impurity gradient and a lower surface concentration, which alleviates precipitation and dislocation issues.
Career Highlights
Ghosh is currently employed at International Business Machines Corporation (IBM), where he continues to innovate and contribute to advancements in technology. His work at IBM has positioned him as a key player in the development of semiconductor technologies.
Collaborations
Throughout his career, Ghosh has collaborated with esteemed colleagues such as Ashok Murgai and Wolfgang Alfred Westdorp. These collaborations have further enriched his research and development efforts.
Conclusion
Hitendra N Ghosh's contributions to the field of silicon crystal growth and semiconductor technology are noteworthy. His innovative patents and work at IBM highlight his commitment to advancing technology and improving industry standards.