Shibukawa, Japan

Hisashi Shimizu

USPTO Granted Patents = 5 

Average Co-Inventor Count = 2.5

ph-index = 1


Location History:

  • Shibukawa, JP (2022)
  • Gunma, JP (2023)

Company Filing History:


Years Active: 2022-2025

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5 patents (USPTO):Explore Patents

Title: Hisashi Shimizu: Innovator in Semiconductor Technology

Introduction

Hisashi Shimizu is a prominent inventor based in Shibukawa, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on innovative methods for manufacturing semiconductor devices and etching processes.

Latest Patents

Among Hisashi Shimizu's latest patents is a method of manufacturing a semiconductor device that utilizes an etching gas comprising a chain hydrocarbon compound expressed as CHF. In this method, the CHF compound is characterized by terminal carbon atoms bonded exclusively to fluorine atoms. Another notable patent involves a dry etching gas composition that includes a sulfur-containing fluorocarbon compound with an unsaturated bond, which is particularly useful for etching silicon-based films.

Career Highlights

Throughout his career, Hisashi Shimizu has worked with notable companies such as Kanto Denka Kogyo Co., Ltd. and Kioxia Corporation. His expertise in semiconductor technology has positioned him as a key figure in the industry.

Collaborations

Hisashi Shimizu has collaborated with talented individuals, including Korehito Kato and Takaya Ishino, contributing to advancements in semiconductor manufacturing and etching techniques.

Conclusion

Hisashi Shimizu's innovative work in semiconductor technology and his contributions to the field through his patents highlight his importance as an inventor. His ongoing efforts continue to shape the future of semiconductor manufacturing.

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