Hisanobu Shimodouzono

Title: Hisanobu Shimodouzono: Innovator in Active Matrix Substrate Technology

Introduction

Hisanobu Shimodouzono is a notable inventor based in Izumi, Japan. He has made significant contributions to the field of active matrix substrate technology, holding two patents that showcase his innovative approach to manufacturing processes.

Latest Patents

His latest patents include the "Active matrix substrate plate and manufacturing method therefor." This invention focuses on creating an active matrix substrate plate with superior properties, achieved through a high-yield manufacturing process that involves four photolithographic fabrication steps. In the first step, the scanning line and the gate electrode extending from the scanning line are formed in the glass plate. The second step involves laminating the gate insulation layer and the semiconductor layer, which consists of an amorphous silicon layer and a n-amorphous silicon layer, to provide the semiconductor layer for the TFT section. The third step includes laminating the transparent conductive layer and the metallic layer, forming the signal line, drain electrode, pixel electrode, and source electrode, while etching removes the n-amorphous silicon layer of the channel gap. Finally, in the fourth step, the protective insulation layer is formed, and both the protective insulation layer and the metal layer above the pixel electrode are removed by etching.

Career Highlights

Hisanobu Shimodouzono has worked with prominent companies such as NEC Corporation and NEC LCD Technologies, Ltd. His experience in these organizations has contributed to his expertise in the field of display technologies and semiconductor manufacturing.

Collaborations

Throughout his career, Shimodouzono has collaborated with notable colleagues, including Shigeru Kimura and Takahiko Watanabe. These collaborations have likely enriched his work and led to advancements in the technologies he has developed.

Conclusion

Hisanobu Shimodouzono is a distinguished inventor whose work in active matrix substrate technology has made a significant impact in the field. His innovative patents and career achievements reflect his dedication to advancing manufacturing processes in the semiconductor industry.