Location History:
- Hitachi, JP (2015)
- Tokyo, JP (2017 - 2020)
Company Filing History:
Years Active: 2015-2020
Title: Hiroyuki Ushiba: Innovator in Exposure Condition Evaluation
Introduction
Hiroyuki Ushiba is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of exposure condition evaluation, holding a total of six patents. His work focuses on improving the accuracy and efficiency of wafer exposure conditions in manufacturing processes.
Latest Patents
One of Ushiba's latest patents is the "Exposure Condition Evaluation Device." This invention aims to provide a device that accurately evaluates a wafer exposure condition or calculates an appropriate exposure condition based on information obtained from an FEM wafer. The device evaluates the exposure condition of a reduction projection exposure device using information from patterns exposed on a sample, correcting feature amounts based on uniform exposure conditions. Another notable patent is the "Pattern Evaluation Device and Visual Inspection Device Comprising Pattern Evaluation Device." This device includes a model estimation unit that estimates a model based on an inspection image, a deformation amount estimation unit that estimates the deformation of the inspection image, and an evaluation unit that compares deformed reference data with the inspection image for evaluation purposes.
Career Highlights
Hiroyuki Ushiba has worked with notable companies such as Hitachi High-Technologies Corporation and Hitachi, Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas in the field of exposure condition evaluation.
Collaborations
Ushiba has collaborated with esteemed colleagues, including Yasutaka Toyoda and Shinichi Shinoda. These partnerships have contributed to the advancement of his inventions and the overall progress in the industry.
Conclusion
Hiroyuki Ushiba is a distinguished inventor whose work in exposure condition evaluation has led to significant advancements in the field. His innovative patents and collaborations with industry leaders highlight his commitment to improving manufacturing processes.