Joetsu, Japan

Hiroyuki Urano

This inventor holds 1 USPTO granted patent. Top assignee: Shin-Etsu Chemical Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroyuki Urano. Retrieved from https://idiyas.com/inventor/hiroyuki-urano-ro5awh6b

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hiroyuki Urano: Innovator in Polymer Technology

Introduction

Hiroyuki Urano is a notable inventor based in Joetsu, Japan. He has made significant contributions to the field of polymer technology, particularly in the development of photosensitive resin compositions. His innovative work has led to advancements in electronic components and patterning methods.

Latest Patents

Hiroyuki Urano holds 1 patent related to a polyimide-based polymer. This patent encompasses a positive photosensitive resin composition, a negative photosensitive resin composition, and various methods for forming cured films and interlayer insulating films. The polymer includes structural units that enhance solvent solubility and enable the formation of fine patterns with high resolution.

Career Highlights

Urano is associated with Shin-Etsu Chemical Ltd., a leading company in the chemical industry. His work at the company has focused on developing advanced materials that are crucial for modern electronic applications. His expertise in polymer chemistry has positioned him as a key figure in his field.

Collaborations

Throughout his career, Hiroyuki Urano has collaborated with notable colleagues, including Masashi Iio and Katsuya Takemura. These collaborations have fostered innovation and contributed to the success of various projects within the company.

Conclusion

Hiroyuki Urano's contributions to polymer technology and his innovative patents have made a significant impact in the field of electronics. His work continues to influence advancements in materials science and engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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