Hiroyuki Oomori

Title: Innovations of Hiroyuki Oomori

Introduction

Hiroyuki Oomori is a prominent inventor based in Ube, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 11 patents. His work primarily focuses on dry etching methods and gas compositions used in semiconductor device production.

Latest Patents

Oomori's latest patents include a dry etching method, a method for producing semiconductor devices, and a dry etching gas composition. The dry etching method involves reacting silicon oxide with gaseous hydrogen fluoride and a gaseous organic amine compound. This innovative approach utilizes a mixture of organic amines that contain at least two compounds represented by a specific formula. The method for producing semiconductor devices includes plasmatizing a dry etching agent and etching a silicon compound film through a mask with a predetermined opening pattern. The dry etching agent consists of various gases, including iodinated and brominated fluorocarbon compounds, unsaturated fluorocarbons, and oxidizing gases.

Career Highlights

Throughout his career, Oomori has worked with notable companies such as Central Glass Company, Limited and Denka Company Limited. His experience in these organizations has allowed him to refine his expertise in semiconductor technologies and contribute to advancements in the field.

Collaborations

Oomori has collaborated with several professionals in his field, including Akifumi Yao and Shoi Suzuki. These collaborations have further enhanced his research and development efforts in semiconductor technology.

Conclusion

Hiroyuki Oomori's innovative work in dry etching methods and semiconductor device production has made a significant impact on the industry. His numerous patents reflect his dedication to advancing technology in this critical field.