Company Filing History:
Years Active: 2008-2014
Title: Hiroyuki Mori: Innovator in Lithographic Patterning
Introduction
Hiroyuki Mori is a notable inventor based in Boise, ID (US). He has made significant contributions to the field of lithographic patterning, holding a total of 6 patents. His work focuses on enhancing the processes involved in substrate patterning, which is crucial for various applications in technology and manufacturing.
Latest Patents
Mori's latest patents include innovative methods of lithographically patterning a substrate. One of his methods involves using photoresist with designated removal and non-removal areas. The process begins with exposing the non-removal areas to radiation, which increases the outer surface roughness of the photoresist without altering its solubility. Following this, the removal areas are exposed to radiation that effectively changes the solubility of the photoresist, allowing it to be cleared from these areas during development. This results in a substrate where the non-removal areas exhibit greater outer surface roughness than before the initial exposure. Other implementations and embodiments of this method are also contemplated.
Career Highlights
Hiroyuki Mori is currently employed at Micron Technology Incorporated, where he continues to advance his research and development efforts. His work at Micron has positioned him as a key player in the field of semiconductor manufacturing and lithography.
Collaborations
Mori collaborates with esteemed colleagues such as Paul D. Shirley and Yoshiki Hishiro. Their combined expertise contributes to the innovative advancements in lithographic techniques and substrate patterning.
Conclusion
Hiroyuki Mori's contributions to lithographic patterning through his patents and work at Micron Technology Incorporated highlight his role as a significant inventor in the field. His innovative methods are paving the way for advancements in technology and manufacturing processes.