Hiroyuki Ikeda

Title: Hiroyuki Ikeda: Pioneering Innovations in Photomask Technology

Introduction

Hiroyuki Ikeda, a prominent inventor based in Yokohama, Japan, has made significant contributions to the field of photomask technology. With an impressive portfolio of 39 patents, his innovative work continues to impact the semiconductor industry profoundly.

Latest Patents

Among his latest inventions is a "Pattern characteristic-detection apparatus for photomask" and the corresponding "Pattern characteristic-detection method for photomask." This advanced apparatus incorporates a detection-data creating portion, a reference-data creating portion, an extracting portion, a first area-setting portion, a detecting portion, and a collecting portion. The system is designed to optimize the detection of pattern characteristics on photomasks by creating and analyzing detection and reference data based on the optical images of patterns formed. This methodology enhances the inspection processes of photomasks, thereby improving the integrity of semiconductor devices.

Additionally, Ikeda has developed methods for repairing, inspecting, and manufacturing photomasks as well as semiconductor devices. One key method involves generating a laser beam, modifying its phase to achieve a smooth brightness distribution, and applying it to the photomask while capturing images to check for defects in mask patterns. His work represents significant advancements in photomask quality assurance and semiconductor manufacturing.

Career Highlights

Hiroyuki Ikeda has held notable positions at leading companies, including Fujitsu Corporation and Toshiba Corporation. His tenure at these organizations has allowed him to leverage his expertise in optical systems and signal processing, facilitating the advancement of photomask technology and its applications in the semiconductor sector.

Collaborations

Throughout his career, Ikeda has collaborated with distinguished professionals in his field, such as Fumio Yamagishi and Takefumi Inagaki. These partnerships have fostered a rich exchange of ideas and innovations, significantly contributing to the success of various projects.

Conclusion

Hiroyuki Ikeda's extensive work and innovations continue to play a crucial role in enhancing photomask technology. His patents not only demonstrate his ingenuity as an inventor but also pave the way for advancements in semiconductor manufacturing processes. As the industry evolves, Ikeda's contributions are likely to remain influential for years to come.