The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2004
Filed:
Dec. 20, 2001
Hiroyuki Ikeda, Yokohama, JP;
Youji Arita, Yokohama, JP;
Matsushita Electric Industrial Co., Ltd., Kadoma, JP;
Abstract
A method for forming a magnetic pattern in a magnetic recording medium, which includes irradiating energy beams to a magnetic recording medium having a magnetic layer on a substrate via a photomask having a transmitting portion and a nontransmitting portion to heat locally an irradiated portion of the magnetic layer. The method also includes applying an external magnetic field to the magnetic layer. The transmitting portion and the non-transmitting portion of the photomask each has a reflectivity of energy beam of 30% or less in at least one surface facing the magnetic recording medium. By using techniques of heating a local portion and applying an external magnetic field in combination, a fine magnetic pattern can be effectively and accurately formed while the production of an interference fringe is suppressed.