The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2008
Filed:
Jul. 03, 2006
Applicants:
Katsuki Ohashi, Yokohama, JP;
Hiromu Inoue, Yokohama, JP;
Akira Ono, Tokyo, JP;
Hiroyuki Ikeda, Yokohama, JP;
Inventors:
Katsuki Ohashi, Yokohama, JP;
Hiromu Inoue, Yokohama, JP;
Akira Ono, Tokyo, JP;
Hiroyuki Ikeda, Yokohama, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki-shi, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03C 5/00 (2006.01); G03F 9/00 (2006.01); G03K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for inspecting a photomask, comprising generating a laser beam, changing a phase of the laser beam to smooth the brightness distribution of the laser beam, applying the smoothed laser beam to the photomask, acquiring an image of the photomask using a sensor while the laser beam and the photomask are relatively moved, examining the image of the photomask for a defect of the mask-pattern of the photomask.