Company Filing History:
Years Active: 2005-2008
Title: **Innovations of Katsuki Ohashi in Photomask Technology**
Introduction
Katsuki Ohashi is an esteemed inventor based in Yokohama, Japan, known for his significant contributions to photomask technology. With a total of three patents to his name, he specializes in methods that enhance the accuracy and efficiency of semiconductor manufacturing processes.
Latest Patents
Ohashi's latest innovations include a series of pivotal patents: the "Method for Repairing a Photomask," the "Method for Inspecting a Photomask," and the "Method for Manufacturing a Semiconductor Device." One notable method for inspecting a photomask involves generating a laser beam, altering its phase to create a smooth brightness distribution, and applying that beam to the photomask. This process allows for image acquisition using a sensor as the laser beam and photomask are moved relatively, which enables the examination of the photomask image for defects in the mask pattern.
Career Highlights
Katsuki Ohashi is employed by Toshiba Corporation, a leader in diverse tech sectors including semiconductors. His work has played a crucial role in advancing the techniques used in photomask production, helping to ensure higher quality and reliability in semiconductor devices.
Collaborations
Throughout his career, Ohashi has collaborated with notable colleagues such as Hiromu Inoue and Akira Ono. These partnerships have fostered an environment of innovation and have contributed to the success of various projects within the company.
Conclusion
Katsuki Ohashi’s contributions to the field of semiconductor technology, particularly through his patents related to photomasks, highlight his ingenuity and commitment to advancing manufacturing processes. His work not only benefits Toshiba Corporation but also sets a standard in the industry, paving the way for future innovations in semiconductor technology.