Hiroyuki Abiko

Title: Hiroyuki Abiko: Innovator in Silicon Crystal Technology

Introduction

Hiroyuki Abiko is a notable inventor based in Niigata, Japan. He has made significant contributions to the field of silicon crystal technology, particularly through his innovative patent related to the Czochralski method.

Latest Patents

Hiroyuki Abiko holds a patent for a "Single crystal pulling-up apparatus of pulling-up silicon single crystal and single crystal pulling-up method of pulling-up silicon single crystal." This invention includes a neck diameter measuring portion that measures the diameter of a grown neck portion. It features a first compensation portion that outputs a first compensated pulling-up speed for the seed crystals based on the difference between a measured value of the diameter of the neck portion and a target value previously stored. Additionally, a second compensation portion outputs a second pulling-up speed while limiting the upper limit of the first pulling-up speed to a first limit value. Furthermore, a crucible rotation number compensation portion lowers the number of rotations of a crucible during the period when the upper limit of the first pulling-up speed is restricted.

Career Highlights

Hiroyuki Abiko is currently employed at GlobalWafers Japan Co., Ltd., where he continues to advance his research and development in silicon crystal technologies. His work has been instrumental in improving the efficiency and effectiveness of silicon crystal production.

Collaborations

Hiroyuki collaborates with esteemed colleagues such as Hironori Banba and Hiromichi Isogai, contributing to a dynamic team focused on innovation in the semiconductor industry.

Conclusion

Hiroyuki Abiko's contributions to silicon crystal technology through his patent and work at GlobalWafers Japan Co., Ltd. highlight his role as a key innovator in the field. His advancements continue to influence the semiconductor industry positively.