Osaka, Japan

Hirotoshi Nakanishi

This inventor holds 23 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Photoresist Chemistry. Top assignee: Sumitomo Chemical Company, Limited. Active years: 1976-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hirotoshi Nakanishi. Retrieved from https://idiyas.com/inventor/hirotoshi-nakanishi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23 

% Patents Active = 100.0


Average Co-Inventor Count = 3.7

ph-index = 7

Forward Citations = 148(Granted Patents)


Location History:

  • Minoo, JA (1976)
  • Minoo, JP (1980)
  • Mishima, JP (1994)
  • Osaka, JP (1985 - 1998)
  • Mishima-gun, JP (2007)

Company Filing History:


Years Active: 1976-2007

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Areas of Expertise:
Photoresist
Chemical Amplification
Polyhydric Phenol
Quinone Diazide
Positive Resist
Radiation Sensitive
Alkali-Soluble Resin
Composition
Synthesis
Benzaldehydes
Sulfonylamides
Phenylacetic Acid
23 patents (USPTO):Explore Patents

Title: Hirotoshi Nakanishi: Pioneering Inventor from Osaka

Introduction: Hirotoshi Nakanishi is a renowned inventor hailing from Osaka, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Nakanishi's latest patents include advancements in robotics, artificial intelligence, and sustainable energy solutions, showcasing his commitment to creating a more efficient and sustainable future.

Career Highlights: With a career spanning over two decades, Nakanishi has worked with leading tech companies and research institutions to develop cutting-edge technologies that have revolutionized various industries.

Collaborations: Throughout his career, Nakanishi has collaborated with top engineers, scientists, and researchers from around the world, fostering a culture of innovation and excellence in all his projects.

Conclusion: Hirotoshi Nakanishi's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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