Taichung, Taiwan

Hirotake Fujita


Average Co-Inventor Count = 16.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2013-2015

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2 patents (USPTO):Explore Patents

Title: Hirotake Fujita: Innovating in Semiconductor Technology

Introduction

Hirotake Fujita, an accomplished inventor based in Taichung, Taiwan, has made significant contributions to the field of semiconductor technology. With two patents to his name, Fujita has demonstrated his expertise and innovative spirit in developing advanced semiconductor devices and processes. His work notably enhances the capabilities of electronic components utilized in modern technology.

Latest Patents

Fujita's most recent patents include a groundbreaking semiconductor device and a method for making the same. The semiconductor device he designed comprises a substrate that features a base linked to an array of semiconductor pillars. These pillars extend from the base, with the substrate integrating multiple trenches that penetrate into the base. Each trench is equipped with a first insulative liner layer, strategically divided into upper and lower segments to expose bit-forming surfaces on the trench side walls. The invention also incorporates buried bit lines, extending from the bit-forming surface to improve the device's overall efficiency.

His second patent describes a self-aligned wet etching process that involves etching a substrate protected by an etch protection layer. This innovative method results in creating multiple spaced trenches, followed by the formation of essential insulating and etch stop layers within each trench. This step ensures that the primary insulator remains protected during the wet etching process, preventing short circuits that could arise from excessive etching.

Career Highlights

Fujita is currently affiliated with Rexchip Electronics Corporation, where he contributes to the advancement of semiconductor fabrication techniques. His extensive knowledge in this field enables him to devise innovative solutions that have the potential to revolutionize electronic device performance.

Collaborations

Throughout his career, Fujita has collaborated with esteemed colleagues, including Kazuaki Takesako and Yoshinori Tanaka. These partnerships have enriched his research and development efforts, fostering a collaborative environment that promotes innovation and the sharing of ideas.

Conclusion

Hirotake Fujita stands as a prominent figure in the realm of semiconductor innovation. His patents reflect a dedication to enhancing technology and improving the efficiency of electronic devices. With his ongoing research and collaboration with other talented professionals, Fujita continues to push the boundaries of semiconductor technology, paving the way for future advancements in this critical field.

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