Tokyo, Japan

Hiroshi Unami

This inventor holds 3 USPTO granted patents. Top assignee: Hitachi-Kokusai Electric Inc.. Active years: 2011-2012.


% Patents Active = 66.7

Average Co-Inventor Count = 7.0

ph-index = 3

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 2011-2012

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3 patents (USPTO):Explore Patents

Title: Hiroshi Unami: Innovator in Semiconductor Manufacturing

Introduction

Hiroshi Unami is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 3 patents. His work focuses on improving the efficiency and yield of semiconductor devices.

Latest Patents

Unami's latest patents include a substrate processing apparatus and method for manufacturing a semiconductor device. This innovative CVD device features a reaction furnace designed for wafer processing. It includes a hermetically sealing seal cap, an isolation flange, and a small chamber that enhances the flow of gases during the manufacturing process. By preventing byproducts such as NH4Cl from adhering to low-temperature sections, the device significantly increases the production yield of semiconductor devices.

Career Highlights

Hiroshi Unami is currently employed at Hitachi-Kokusai Electric Inc., where he continues to develop cutting-edge technologies in semiconductor manufacturing. His expertise in this area has positioned him as a key figure in the industry.

Collaborations

Unami has collaborated with notable coworkers, including Takashi Ozaki and Tomoshi Taniyama, contributing to various projects that advance semiconductor technology.

Conclusion

Hiroshi Unami's innovative work in semiconductor manufacturing has led to significant advancements in the field. His patents reflect a commitment to improving production efficiency and device yield, making him a valuable contributor to the industry.

Profile summary based on public USPTO records.
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