This inventor holds 1 USPTO granted patent. Top assignee: Renesas Technology Corp.. Active years: 2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2005
Title: Hiroshi Oshita: Innovator in Semiconductor Manufacturing
Introduction
Hiroshi Oshita is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent.
Latest Patents
Hiroshi Oshita holds a patent for a method of manufacturing semiconductor devices. This patent focuses on the polishing process of tungsten and silicon oxide films. It involves determining polishing parameters based on the relationship between a residual step and pattern density. The goal is to ensure that the residual step does not exceed a predetermined limit during the polishing process. This innovation leads to the creation of semiconductor devices with optimal planarization and effective plug formation in contact holes.
Career Highlights
Oshita is associated with Renesas Technology Corporation, where he applies his expertise in semiconductor technology. His work has been instrumental in advancing manufacturing processes within the company.
Collaborations
Hiroshi Oshita collaborates with Takashi Watadani, contributing to the development of innovative solutions in semiconductor manufacturing.
Conclusion
Hiroshi Oshita's contributions to semiconductor manufacturing through his patent demonstrate his commitment to innovation in the field. His work continues to influence the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile