Tokyo, Japan

Hiroshi Nozue

This inventor holds 20 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Memory Management. Top assignees: Nec Corporation, Kabushiki Kaisha Toshiba, Dai Nippon Printing Co., Ltd.. Active years: 1988-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroshi Nozue. Retrieved from https://idiyas.com/inventor/hiroshi-nozue

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20 

% Patents Active = 95.0


Average Co-Inventor Count = 1.7

ph-index = 7

Forward Citations = 292(Granted Patents)


Location History:

  • Chiba-ken, JP (1998)
  • Tokyo, JP (1988 - 2020)

Company Filing History:


Years Active: 1988-2020

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Areas of Expertise:
Memory Management
Semiconductor Manufacturing
Electron Beam Lithography
Photomask
E-Beam Writing
Wafer Stepper
Patterning Method
Alignment Method
Memory Protection
Transfer Mask
Coulomb Correction
Cache Flushing
20 patents (USPTO):Explore Patents

Title: Hiroshi Nozue - Innovative Inventor from Tokyo

Introduction: Hiroshi Nozue is a renowned inventor hailing from Tokyo, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Hiroshi Nozue holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his diverse range of expertise and creativity.

Career Highlights: With over two decades of experience in the industry, Hiroshi Nozue has worked with leading tech companies and research institutions, spearheading projects that have revolutionized the way we interact with technology on a daily basis.

Collaborations: Throughout his career, Hiroshi Nozue has collaborated with top engineers, scientists, and designers from around the world, fostering a culture of innovation and excellence in all his projects.

Conclusion: Hiroshi Nozue's passion for pushing the boundaries of technology and his relentless pursuit of innovation continue to inspire the next generation of inventors and entrepreneurs worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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