The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 1996
Filed:
Nov. 04, 1994
Hiroshi Nozue, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
A method of manufacturing a reticle having a desired pattern, includes the step of projecting electron beams to a mask blank including a glass substrate on which an electron beam sensitive layer is applied. The mask blank is held in place in the same situation as a situation in which the reticle is held when a stepper exposes a semiconductor wafer to light through said reticle. For instance, the mask blank being in place so that the electron beam sensitive layer faces downwardly and the electron beams is projected from a bottom of the layer. The method can eliminate dimensional errors of a pattern and a dislocation of a pattern on a semiconductor wafer which might occur due to a curvature of a reticle.