The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 14, 1997

Filed:

Oct. 24, 1996
Applicant:
Inventors:

Junko Morikawa, Tokyo, JP;

Hiroshi Nozue, Tokyo, JP;

Hiroshi Yamashita, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430296 ; 430330 ; 430942 ; 2504922 ;
Abstract

A method for writing on a semiconductor wafer using electron beams is provided. One embodiment of the method includes the steps of using electron beams to irradiate a semiconductor substrate on which a resist layer has been formed, to thereby draw patterns on the resist layer, and then baking the resist layer and substrate in a vacuum.


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