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For the Inventor, By the Inventor

Kawasaki, Japan

Hiroshi Horie

This inventor holds 8 USPTO granted patents. Top assignee: Fujitsu Corporation. Active years: 1985-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroshi Horie. Retrieved from https://idiyas.com/inventor/hiroshi-horie-tbh3and3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 8

% Patents Active = 100.0

Average Co-Inventor Count = 2.3

ph-index = 7

Forward Citations = 217(Granted Patents)


Location History:

  • Ebina, JP (1985 - 1990)
  • Kawasaki, JP (1994 - 1999)

Company Filing History:

goldMedal8 out of 39,381 
 
Fujitsu Corporation
 patents

Years Active: 1985-1999

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8 patents (USPTO):Explore Patents
1. 5877089 - Slurry containing manganese oxide (1999-03-02),
2. 5763325 - Fabrication process of a semiconductor device using a slurry containing (1998-06-09),
3. 5621239 - SOI device having a buried layer of reduced resistivity (1997-04-15),
4. 5562529 - Apparatus and method for uniformly polishing a wafer (1996-10-08),
5. 5406113 - Bipolar transistor having a buried collector layer (1995-04-11),
6. 5278102 - SOI device and a fabrication process thereof (1994-01-11),
7. 4935804 - Semiconductor device (1990-06-19),
8. 4545114 - Method of producing semiconductor device (1985-10-08),

Title: Hiroshi Horie: Innovator in Semiconductor Technology

Introduction

Hiroshi Horie is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work primarily focuses on the development of advanced polishing processes and materials used in semiconductor fabrication.

Latest Patents

Horie's latest patents include a slurry containing manganese oxide, which serves as a primary component of abrasive particles. This innovative slurry is designed to enhance the polishing process in semiconductor manufacturing. Additionally, he has developed a fabrication process for semiconductor devices that utilizes this manganese oxide abrasive, showcasing his commitment to improving efficiency and effectiveness in the industry.

Career Highlights

Hiroshi Horie has built a successful career at Fujitsu Corporation, where he has been instrumental in advancing semiconductor technologies. His expertise in polishing processes has positioned him as a key figure in the field, contributing to the development of high-performance semiconductor devices.

Collaborations

Throughout his career, Horie has collaborated with notable colleagues, including Yoshihiro Arimoto and Sadahiro Kishii. These partnerships have fostered innovation and have played a crucial role in the success of his projects.

Conclusion

Hiroshi Horie's contributions to semiconductor technology through his patents and collaborative efforts highlight his importance in the field. His work continues to influence advancements in semiconductor fabrication processes, making him a notable inventor in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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