Hiroshi Furuta

Title: Hiroshi Furuta: Innovator in Semiconductor Technology

Introduction

Hiroshi Furuta is a prominent inventor based in Kochi, Japan, known for his contributions to semiconductor technology. With a total of 5 patents, he has made significant advancements in the manufacturing methods of semiconductor devices and thin film transistors.

Latest Patents

Furuta's latest patents include a manufacturing method of a semiconductor device that incorporates an active layer of zinc oxide with controlled crystal lattice spacing. This method involves forming an oxide semiconductor thin film layer of zinc oxide, ensuring that a portion of this layer has lattice planes oriented perpendicularly to the substrate with a lattice spacing of at least 2.619 Å. Another notable patent is for a manufacturing method of a thin film transistor that includes low resistance conductive thin films. This method outlines the formation of source and drain electrodes on a substrate, followed by the creation of low resistance conductive thin films that define a gap between them. An oxide semiconductor thin film layer is then formed on the upper surface of these conductive films, functioning as a channel.

Career Highlights

Throughout his career, Hiroshi Furuta has worked with notable organizations such as the Kochi Industrial Promotion Center and Casio Computer Co., Ltd. His work has significantly impacted the field of semiconductor technology, leading to innovative solutions and advancements.

Collaborations

Furuta has collaborated with esteemed colleagues, including Takashi Hirao and Takahiro Hiramatsu, contributing to various projects and research initiatives in the semiconductor domain.

Conclusion

Hiroshi Furuta's innovative work in semiconductor technology and his impressive portfolio of patents highlight his role as a key figure in the industry. His contributions continue to influence advancements in semiconductor manufacturing methods and thin film transistors.