Hiroo Ono

Title: Hiroo Ono: Innovator in Plasma Processing Technology

Introduction

Hiroo Ono is a distinguished inventor based in Yamanashi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 7 patents. His innovative work has advanced the capabilities of semiconductor manufacturing processes.

Latest Patents

One of his latest patents is a plasma processing device. This device features a magnetic field forming mechanism where each magnet segment is constructed to face a vacuum chamber. Adjoining magnet segments are synchronously rotated in opposite directions, allowing for precise control of a multi-pole magnetic field surrounding a semiconductor wafer. This innovation enables easy adjustments to the magnetic field status according to the type of plasma processing, thereby enhancing processing efficiency.

Another notable patent is the magnetron plasma processing apparatus. This apparatus includes a dipole ring magnet with anisotropic segment magnets arranged in a ring-like shape around the chamber's outer wall. A magnetic field gradient is formed, decreasing in strength from the E pole side toward the W pole side. This design allows for localized increases in magnetic field strengths, improving the effectiveness of the magnetron plasma process.

Career Highlights

Hiroo Ono has worked with prominent companies in the semiconductor industry, including Tokyo Electron Limited and Shin-Etsu Chemical Co., Ltd. His experience in these organizations has contributed to his expertise in plasma processing technologies.

Collaborations

Throughout his career, Hiroo has collaborated with notable colleagues such as Tetsu Oosawa and Teruo Asakawa. These partnerships have fostered innovation and development in the field of plasma processing.

Conclusion

Hiroo Ono's contributions to plasma processing technology have significantly impacted the semiconductor industry. His innovative patents and collaborations highlight his role as a leading inventor in this field.