The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2004
Filed:
Mar. 04, 2002
Tomomi Yamasaki, Himeji, JP;
Hidetoshi Kimura, Nirasaki, JP;
Junichi Arami, Tokyo, JP;
Hiroo Ono, Nirasaki, JP;
Akira Koshiishi, Nirasaki, JP;
Koji Miyata, Takefu, JP;
Other;
Abstract
When a substrate is to be subjected to a magnetron plasma process, a dipole ring magnet is provided, in which a large number of anisotropic segment magnets are arranged in a ring-like shape around the outer wall of a chamber A magnetic field gradient, wherein the magnetic field strength decreases from the E pole side toward the W pole side in a direction perpendicular to a magnetic field direction B, is formed in a plane perpendicular to the direction of an electric field between a pair of electrodes separated from each other. The anisotropic segment magnets have a first section a including anisotropic segment magnets arranged in the vicinity of a region A located outside an E pole side end of the process substrate with an N pole thereof being directed toward this region, and a second portion b including anisotropic segment magnets arranged with an S pole thereof being directed toward this region, to locally increase the magnetic field strengths of the first and second regions.