The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2008
Filed:
Sep. 19, 2002
Hiroo Ono, Yamanashi, JP;
Koichi Tateshita, Yamanashi, JP;
Masanobu Honda, Yamanashi, JP;
Kazuya Nagaseki, Yamanashi, JP;
Daisuke Hayashi, Yamanashi, JP;
Hiroo Ono, Yamanashi, JP;
Koichi Tateshita, Yamanashi, JP;
Masanobu Honda, Yamanashi, JP;
Kazuya Nagaseki, Yamanashi, JP;
Daisuke Hayashi, Yamanashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Each magnet segmentof a magnetic field forming mechanismis constructed such that, after the magnetic pole of each magnet segmentset to face a vacuum chamberas shown in FIG.A, adjoining magnet segmentsare synchronously rotated in opposite directions, and hence every other magnet elementis rotated in the same direction as shown in FIGS.B,C to thereby control the status of a multi-pole magnetic field formed in the vacuum chamberand surrounding a semiconductor wafer W. Therefore, the status of a multi-pole magnetic field can be easily controlled and set appropriately according to a type of plasma processing process to provide a good processing easily.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile