Tokyo, Japan

Hiroki Tadatomo

This inventor holds 4 USPTO granted patents and 4 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2023-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroki Tadatomo. Retrieved from https://idiyas.com/inventor/hiroki-tadatomo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 4 

% Patents Active = 75.0

Average Co-Inventor Count = 5.2

ph-index = 1


Company Filing History:


Years Active: 2023-2026

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Innovations by Hiroki Tadatomo

Introduction

Hiroki Tadatomo is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate processing technology. His work focuses on enhancing the efficiency and effectiveness of substrate processing methods.

Latest Patents

Hiroki Tadatomo holds a patent for a substrate processing apparatus and substrate processing method. This innovative apparatus includes a first transfer path for a substrate after MOR film formation and before exposure. It also features a second transfer path for the substrate after exposure. Additionally, the apparatus is equipped with one or more nitrogen atmosphere placement stages. These stages are designed to place the substrate in an environment with a nitrogen concentration higher than that of air.

Career Highlights

Hiroki Tadatomo is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His role at the company has allowed him to contribute to advancements in substrate processing technologies.

Conclusion

Hiroki Tadatomo's innovative work in substrate processing has the potential to impact various applications in the semiconductor industry. His patent reflects a commitment to improving processing methods and enhancing product quality.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…