logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12733422 B1

PDFFull Text
Date of Patent:
Sep. 08, 2026

Filed:

Jan. 22, 2024

Substrate treatment method, substrate treatment apparatus, and computer storage medium

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Kosuke Yoshihara, Koshi City, JP;

Yuichi Terashita, Koshi City, JP;

Yukinobu Otsuka, Koshi City, JP;

Shinsuke Takaki, Koshi City, JP;

Hiroki Tadatomo, Tokyo, JP;

Naoki Shibata, Tokyo, JP;

Assignee:

Tokyo Electron Limited, Tokyo, JP;

Attorney:

Posz Law Group, PLC

Primary Examiner:

Jiong-Ping Lu

Int. Cl.
CPC ...
H10P 50/00 (2026.01); C23C 16/04 (2006.01); C23C 16/455 (2006.01); C23C 16/46 (2006.01); G03F 7/004 (2006.01); G03F 7/16 (2006.01); G03F 7/36 (2006.01); G03F 7/38 (2006.01); G03F 7/40 (2006.01); H10P 14/20 (2026.01); H10P 76/00 (2026.01); H10P 76/40 (2026.01); H10P 95/90 (2026.01);
U.S. Cl.
CPC ...
H10P 50/692 (2026.01); C23C 16/042 (2013.01); C23C 16/45517 (2013.01); C23C 16/46 (2013.01); G03F 7/0042 (2013.01); G03F 7/168 (2013.01); G03F 7/36 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); H10P 14/3241 (2026.01); H10P 76/00 (2026.01); H10P 76/4085 (2026.01); H10P 95/906 (2026.01);
Abstract

A substrate treatment method includes developing a substrate which has a coating film of a metal-containing resist formed thereon and has been subjected to an exposure treatment and a heat treatment after the exposure treatment. The developing includes exposing the substrate to an acid atmosphere being an atmosphere containing gas of a weak acid under a pressure of an atmospheric pressure or higher; and removing a product produced by a reaction between the metal-containing resist and the gas of the weak acid, by heating the substrate.

Find Patent Forward Citations

Yoshihara, Kosuke. (2026). Substrate treatment method, substrate treatment apparatus, and computer storage medium (U.S. Patent No. 12733422). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12733422

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…