The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2026
Filed:
Jan. 22, 2024
Tokyo Electron Limited, Tokyo, JP;
Kosuke Yoshihara, Koshi City, JP;
Yuichi Terashita, Koshi City, JP;
Yukinobu Otsuka, Koshi City, JP;
Shinsuke Takaki, Koshi City, JP;
Hiroki Tadatomo, Tokyo, JP;
Naoki Shibata, Tokyo, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate treatment method includes developing a substrate which has a coating film of a metal-containing resist formed thereon and has been subjected to an exposure treatment and a heat treatment after the exposure treatment. The developing includes exposing the substrate to an acid atmosphere being an atmosphere containing gas of a weak acid under a pressure of an atmospheric pressure or higher; and removing a product produced by a reaction between the metal-containing resist and the gas of the weak acid, by heating the substrate.