Hiroki Miura

Title: Innovations of Hiroki Miura in Film Deposition Technology.

Introduction

Hiroki Miura is a notable inventor based in Iwate, Japan. He has made significant contributions to the field of film deposition technology. His innovative approach has led to the development of a unique method that enhances the efficiency of film deposition processes.

Latest Patents

Hiroki Miura holds 1 patent for his invention titled "Film deposition method and film deposition apparatus." This patent describes a film deposition method that utilizes a specialized apparatus. The apparatus includes a source gas supply part and a cleaning gas supply part. The method involves adsorbing a source gas on a substrate without the need for a purge gas. A reaction product is then deposited on the substrate by supplying a reaction gas that reacts with the source gas.

Career Highlights

Hiroki Miura is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work focuses on advancing film deposition techniques, which are crucial for the production of high-quality semiconductor devices. His expertise in this area has positioned him as a valuable asset to his team and the company.

Collaborations

Hiroki Miura collaborates with his coworker, Masato Koakutsu, to further enhance their research and development efforts. Together, they work on innovative solutions that push the boundaries of film deposition technology.

Conclusion

Hiroki Miura's contributions to film deposition technology exemplify the spirit of innovation in the semiconductor industry. His patent and ongoing work at Tokyo Electron Limited highlight his commitment to advancing this critical field.