Nirasaki, Japan

Hiroki Matsumaru

USPTO Granted Patents = 4 


Average Co-Inventor Count = 5.9

ph-index = 3

Forward Citations = 29(Granted Patents)


Location History:

  • Nirasaki, JP (2009 - 2011)
  • Sendai, JP (2012)

Company Filing History:


Years Active: 2009-2012

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4 patents (USPTO):Explore Patents

Title: Innovative Contributions of Hiroki Matsumaru

Introduction

Hiroki Matsumaru is a distinguished inventor residing in Nirasaki, Japan. With a total of four registered patents, Matsumaru has made significant contributions to the field of plasma processing technology, enhancing the capabilities and efficiency of various apparatus used in the industry.

Latest Patents

Matsumaru's latest patents include a sophisticated plasma processing apparatus. This apparatus features a mounting table with a temperature-adjustable body and an electrostatic chuck, designed to efficiently adsorb substrates. It incorporates first and second heat transfer gas diffusion regions, strategically positioned to optimize heat distribution. Remarkably, the volume ratio of the second heat transfer gas region to the first is maintained at or below 0.1, ensuring fine-tuned processing capabilities.

Another noteworthy patent by Matsumaru pertains to an electrode plate for plasma processing apparatuses. This invention outlines a process container that accommodates the target substrate under reduced pressure. Equipped with a first electrode and a supply system for process gas, the design also includes an RF electric field formation system for generating plasma. The intricacies of the main surface include a series of protrusions that enhance plasma generation efficiency.

Career Highlights

Hiroki Matsumaru has an impressive professional background, having worked with notable companies within the industry. His tenure at Tokyo Electron Limited and Octec, Inc. has equipped him with a wealth of knowledge and experience in the development of advanced technological solutions.

Collaborations

Throughout his career, Matsumaru has collaborated with talented professionals, including Shinji Himori and Kazuya Nagaseki. These collaborations have propelled innovative projects forward, showcasing the power of teamwork in driving advancements in technology.

Conclusion

In summary, Hiroki Matsumaru stands out as a prominent inventor in the realm of plasma processing technology. His patents reflect a commitment to innovation and efficiency, marking significant milestones in his career. As the industry continues to evolve, Matsumaru's contributions will undoubtedly play a vital role in shaping the future of plasma processing applications.

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