The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2011
Filed:
Jul. 20, 2009
Katsuya Okumura, Tokyo, JP;
Shinji Himori, Nirasaki, JP;
Kazuya Nagaseki, Nirasaki, JP;
Hiroki Matsumaru, Nirasaki, JP;
Shoichiro Matsuyama, Nirasaki, JP;
Toshiki Takahashi, Esashi, JP;
Katsuya Okumura, Tokyo, JP;
Shinji Himori, Nirasaki, JP;
Kazuya Nagaseki, Nirasaki, JP;
Hiroki Matsumaru, Nirasaki, JP;
Shoichiro Matsuyama, Nirasaki, JP;
Toshiki Takahashi, Esashi, JP;
Octec Inc., Tokyo, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma processing apparatus for performing a plasma process on a target substrate includes a process container configured to accommodate the target substrate and to reduce pressure therein. A first electrode is disposed within the process container. A supply system is configured to supply a process gas into the process container. An electric field formation system is configured to form an RF electric field within the process container so as to generate plasma of the process gas. A number of protrusions are discretely disposed on a main surface of the first electrode and protrude toward a space where the plasma is generated.