Company Filing History:
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Years Active: 2022-2025
Title: Hiroki Kajita: Innovator in Sputtering Technology
Introduction
Hiroki Kajita is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of sputtering technology, particularly through his innovative patents. With a total of 2 patents, Kajita's work focuses on enhancing the efficiency and quality of sputtering targets.
Latest Patents
Kajita's latest patents include a Magnesium oxide sputtering target and a MgO sintered sputtering target. The Magnesium oxide sputtering target is designed from a magnesium oxide sintered body, where the ratio of crystal grains with 20 or more pinholes is 50% or less. This invention aims to minimize particle generation during the sputtering process. The MgO sintered sputtering target features a grain orientation spread (GOS) of 75% or higher and a kernel average misorientation (KAM) of 90% or higher. The objective of this invention is to provide a sputtering target that effectively reduces particle formation.
Career Highlights
Throughout his career, Hiroki Kajita has worked with prominent companies such as JX Advanced Metals Corporation and JX Nippon Mining & Metals Corporation. His experience in these organizations has contributed to his expertise in the field of materials science and engineering.
Collaborations
Kajita has collaborated with notable colleagues, including Yoshitaka Shibuya and Satoyasu Narita. These partnerships have fostered innovation and development in his research endeavors.
Conclusion
Hiroki Kajita's contributions to sputtering technology through his patents reflect his commitment to advancing the field. His work continues to influence the industry, showcasing the importance of innovation in materials science.