The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2025
Filed:
Oct. 09, 2019
Applicant:
Jx Nippon Mining & Metals Corporation, Tokyo, JP;
Inventors:
Assignee:
JX ADVANCED METALS CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C01F 5/02 (2006.01); C23C 14/08 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3426 (2013.01); C01F 5/02 (2013.01); C23C 14/081 (2013.01); C23C 14/3407 (2013.01); C01P 2002/60 (2013.01); C01P 2004/03 (2013.01); C01P 2004/61 (2013.01); C01P 2006/80 (2013.01);
Abstract
A sputtering target configured from a magnesium oxide sintered body, wherein a ratio of crystal grains of the magnesium oxide sintered body in which a number of pinholes in a single crystal grain is 20 or more is 50% or less. The present invention is a sputtering target configured from a magnesium oxide sintered body in which the generation of particles during sputtering is less.