Jx Nippon Mining Metals Corporation

Jx Advanced Metals Corporation

Hiroki Kajita

Yoshitaka Shibuya

Satoyasu Narita

A sputtering target configured from a magnesium oxide sintered body, wherein a ratio of crystal grains of the magnesium oxide sintered body in which a number of pinholes in a single crystal grain is 20 or more is 50% or less. The present invention is a sputtering target configured from a magnesium oxide sintered body in which the generation of particles during sputtering is less.

Magnesium oxide sputtering target

A MgO sintered sputtering target, wherein a ratio of GOS (Grain Orientation Spread) being 0&#xb0; to 1&#xb0; is 75% or higher. A MgO sintered sputtering target, wherein a ratio of KAM (Kernel Average Misorientation) being 0&#xb0; to 2&#xb0; is 90% or higher. An object of the present invention is to provide a MgO sintered sputtering target capable of reducing particles.

Growing community of inventors

Ibaraki, Japan

Hiroki Kajita