Albany, NY, United States of America

Hirokazu Aizawa

USPTO Granted Patents = 6 

Average Co-Inventor Count = 3.6

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2020-2025

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6 patents (USPTO):

Title: Hirokazu Aizawa: Innovator in Substrate Processing Technologies

Introduction

Hirokazu Aizawa is a prominent inventor based in Albany, NY, known for his significant contributions to substrate processing technologies. With a total of six patents to his name, Aizawa has made remarkable advancements in the field, particularly in methods involving conductive materials.

Latest Patents

Aizawa's latest patents include innovative methods such as "Metal Hard Mask Integration" and "Method of Conductive Material Deposition." The "Metal Hard Mask Integration" patent describes a process for etching a recess in a substrate using a metal hard mask layer, which involves several steps to ensure the integrity of the conductive layers. The "Method of Conductive Material Deposition" outlines a technique for processing a substrate that includes filling and patterning recesses with conductive materials, ensuring precise control over the deposition heights.

Career Highlights

Hirokazu Aizawa works at Tokyo Electron Limited, a leading company in the semiconductor industry. His work has been instrumental in developing advanced processing techniques that enhance the performance and reliability of electronic devices.

Collaborations

Aizawa collaborates with talented coworkers such as Kaoru Maekawa and Nicholas Joy, contributing to a dynamic team focused on innovation in substrate processing.

Conclusion

Hirokazu Aizawa's contributions to substrate processing technologies through his patents and work at Tokyo Electron Limited highlight his role as a key innovator in the field. His advancements continue to influence the semiconductor industry and pave the way for future innovations.

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