This inventor holds 1 USPTO granted patent. Top assignee: Ebara Corporation. Active years: 2018.
Company Filing History:
Years Active: 2018
Title: Hirofumi Ichihara: Innovator in Substrate Measurement Technology
Introduction
Hirofumi Ichihara is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate measurement technology. His innovative approach has led to the development of a unique patent that enhances the precision of substrate processing.
Latest Patents
Ichihara holds a patent for a "Substrate peripheral portion measuring device, and substrate peripheral portion polishing apparatus." This invention features a projecting/receiving unit that projects laser light onto the peripheral portion of a substrate while receiving the reflected light. The system operates effectively even when a liquid is flowing on the substrate, allowing for real-time monitoring of the polishing state. The signal processing controller processes the electric signal of the reflected light to determine the condition of the peripheral portion being polished. This technology also enables the detection of the polish end point, ensuring optimal performance during substrate processing.
Career Highlights
Hirofumi Ichihara is currently employed at Ebara Corporation, where he continues to innovate and develop advanced technologies. His work has been instrumental in improving substrate processing techniques, which are crucial in various manufacturing applications.
Collaborations
Ichihara collaborates with talented colleagues, including Mitsuo Tada and Tamami Takahashi. Their combined expertise fosters a creative environment that drives innovation within their projects.
Conclusion
Hirofumi Ichihara's contributions to substrate measurement technology exemplify the impact of innovative thinking in engineering. His patent reflects a commitment to enhancing manufacturing processes, showcasing the importance of precision in technology.