Hirofumi Asanuma

Title: The Innovations of Hirofumi Asanuma

Introduction

Hirofumi Asanuma is an accomplished inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing through his innovative designs and solutions. His extensive knowledge and expertise have led to the development of advanced technologies aimed at enhancing substrate processing.

Latest Patents

Hirofumi Asanuma holds one patent for a "Substrate support device and plasma processing apparatus." This invention provides a substrate support device that effectively prevents the production of powder dust during operations. Notably, the design includes a thermoconductive intermediate member situated between a base table and a substrate support table, incorporating a communication aperture path. This unique structure enables the flow of inert gas while safeguarding the thermoconductive intermediate member through the use of an elastic member, such as a bellows tube.

Career Highlights

Hirofumi Asanuma works with Canon Anelva Corporation, a renowned leader in the field of semiconductor manufacturing equipment. His role within the organization showcases his commitment to pushing the boundaries of technology and innovation. As an inventor, he has focused on designing devices that enhance operational efficiency in plasma processing applications.

Collaborations

Throughout his career, Hirofumi has collaborated with talented colleagues, including Yohsuke Shibuya and Yasuyuki Shirai. Together, they have worked on various projects that highlight their collective expertise and commitment to innovation in the semiconductor industry.

Conclusion

Hirofumi Asanuma's contributions to the field of plasma processing underscore the importance of innovation in technology. With his patent for the substrate support device, he continues to pave the way for advancements in semiconductor manufacturing, exemplifying the role of dedicated inventors in driving progress and efficiency within the industry.