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For the Inventor, By the Inventor

Shizuoka, Japan

Hiroaki Niino

USPTO Granted Patents = 22


Average Co-Inventor Count = 3.2

ph-index = 7

Forward Citations = 187(Granted Patents)


Location History:

  • Nagahama, JP (1989 - 1997)
  • Nara, JP (1996 - 2002)
  • Nara-ken, JP (2003)
  • Shizuoka, JP (2004 - 2006)

Company Filing History:

goldMedal22 out of 90,594 
 
Canon Kabushiki Kaisha
 patents

Years Active: 1989-2006

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22 patents (USPTO):Explore Patents
1. 7051671 - Vacuum processing apparatus in which high frequency powers having mutually different frequencies are used to generate plasma for processing an article (2006-05-30),
2. 6861373 - Vacuum processing method and semiconductor device manufacturing method in which high-frequency powers having mutually different frequencies are applied to at least one electrode (2005-03-01),
3. 6849123 - Plasma processing method and method for manufacturing semiconductor device (2005-02-01),
4. 6696108 - Vacuum processing method (2004-02-24),
5. 6632578 - Electrophotographic light-receiving member and process for its production (2003-10-14),
6. 6379852 - Electrophotographic light-receiving member (2002-04-30),
7. 6294299 - Electrophotographic light-receiving member (2001-09-25),
8. 6090513 - Eclectrophotographic light-receiving member and process for its (2000-07-18),
9. 5945241 - Light receiving member for electrophotography and fabrication process (1999-08-31),
10. 5939230 - Light receiving member (1999-08-17),
11. 5738963 - Light-receiving member for electrophotography having a photoconductive (1998-04-14),
12. 5656404 - Light receiving member with an amorphous silicon photoconductive layer (1997-08-12),
13. 5561021 - Electrophotographic photosensitive member having a metal oxide material (1996-10-01),
14. 5514217 - Microwave plasma CVD apparatus with a deposition chamber having a (1996-05-07),
15. 5480750 - Electrophotographic process and electrophotographic apparatus (1996-01-02),

Title: Hiroaki Niino: Innovator in Vacuum Processing Technology

Introduction

Hiroaki Niino, based in Shizuoka, Japan, is a prolific inventor known for his significant contributions to the field of vacuum processing technology. With a remarkable portfolio of 22 patents, Niino has made notable advancements that have the potential to impact various industries significantly.

Latest Patents

Niino's latest patents include a vacuum processing apparatus that employs high-frequency powers with distinct frequencies to generate plasma for article processing. This innovative method involves placing an article in a reaction container while simultaneously supplying at least two high-frequency powers to the same electrode. The unique aspect of this invention is that it ensures the frequencies and power values of the supplied powers meet specific relationships for optimized performance.

Additionally, Niino's vacuum processing method for semiconductor device manufacturing also uses high-frequency powers on electrodes to generate plasma within the reaction container, further refining the processing capabilities of semiconductor manufacturing.

Career Highlights

Hiroaki Niino has spent a significant part of his career at Canon Kabushiki Kaisha, a leading company renowned for its technological innovations. His work focuses on enhancing vacuum processing methods, demonstrating his commitment to advancing semiconductor processing technologies.

Collaborations

Throughout his career, Niino has collaborated with distinguished colleagues, including Shinji Tsuchida and Satoshi Kojima. These collaborations have contributed to a robust exchange of ideas and innovations in their respective fields.

Conclusion

Hiroaki Niino exemplifies the spirit of innovation in the field of vacuum processing technology. His inventions not only advance the current technological landscape but also pave the way for future developments in semiconductor manufacturing. Through his work at Canon Kabushiki Kaisha and collaboration with other skilled individuals, Niino's impact in the field will be felt for years to come.

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