The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2006
Filed:
Jun. 25, 2004
Makoto Aoki, Shizuoka, JP;
Toshiyasu Shirasuna, Shizuoka, JP;
Hiroaki Niino, Shizuoka, JP;
Kazuyoshi Akiyama, Shizuoka, JP;
Hitoshi Murayama, Shizuoka, JP;
Shinji Tsuchida, Shizuoka, JP;
Daisuke Tazawa, Shizuoka, JP;
Yukihiro Abe, Shizuoka, JP;
Makoto Aoki, Shizuoka, JP;
Toshiyasu Shirasuna, Shizuoka, JP;
Hiroaki Niino, Shizuoka, JP;
Kazuyoshi Akiyama, Shizuoka, JP;
Hitoshi Murayama, Shizuoka, JP;
Shinji Tsuchida, Shizuoka, JP;
Daisuke Tazawa, Shizuoka, JP;
Yukihiro Abe, Shizuoka, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A vacuum processing method including placing an article to be processed in a reaction container and simultaneously supplying at least two high-frequency powers having different frequencies to the same high-frequency electrode to generate plasma in the reaction container by the high-frequency powers introduced into the reaction container from the high-frequency electrode. The frequencies and power values of the at least two high-frequency powers supplied satisfy a required relationship.