Koshi-Machi, Japan

Hiroaki Kurishima


Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 2004-2009

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4 patents (USPTO):Explore Patents

Title: **Hiroaki Kurishima: Innovator in Coating Film Technology**

Introduction

Hiroaki Kurishima, a talented inventor based in Koshi-Machi, Japan, holds an impressive total of four patents. His work primarily focuses on innovative methods and apparatuses for coating film formation, which are crucial in various manufacturing processes, particularly in the semiconductor industry.

Latest Patents

Kurishima's pioneering contributions include two notable patents related to coating film technology. The first patent describes a "Coating Film Forming Method and Apparatus," where a coating solution is applied to a horizontally held, rotating wafer. This method efficiently spirals the coating solution from the center to the outer area of the wafer, enhancing the uniformity of the film. The second patent, titled "Coating Film Forming Method and System," introduces an improved approach to monitor and rectify uncoated regions on a substrate. Utilizing both main and auxiliary nozzles, this system ensures a consistent coating thickness while efficiently addressing any inconsistencies detected during the process.

Career Highlights

Hiroaki Kurishima is associated with Tokyo Electron Limited, a leading company in semiconductor production equipment. His role involves a significant contribution to developing advanced coating technologies that enhance manufacturing precision and efficiency. Kurishima's innovative methods have had a considerable impact on the coatings applied in semiconductor fabrication.

Collaborations

Throughout his career, Kurishima has worked alongside esteemed colleagues, including Tomohide Minami and Shinichi Sugimoto. This collaborative environment fosters creativity and innovation, leading to groundbreaking advancements in their shared field.

Conclusion

Hiroaki Kurishima is a prominent figure in the realm of coating film technology, with multiple patents that underscore his innovative spirit and dedication to improving manufacturing processes. His work not only demonstrates technical prowess but also a commitment to enhancing the efficiency of semiconductor production. As he continues his journey at Tokyo Electron Limited, Kurishima’s contributions are sure to influence the industry for years to come.

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